A channel stop is self-aligned with a trench sidewall of a trench-isolated semiconductor architecture, so that there is no alignment tolerance between the stop and the trench wall. An initial masking layer, through which the trench pattern is to be formed in a semiconductor island layer, is used as a...http://www.google.de/patents/US5248894?utm_source=gb-gplus-sharePatent US5248894 - Self-aligned channel stop for trench-isolated island
