A method of patterning a layer of reflective material, such as a layer of conductor metal, using a layer of antireflection coating material sandwiched between two layers of photoresist. A first layer of photoresist is formed on an integrated circuit wafer and provides a planar surface for subsequent...http://www.google.de/patents/US5871886?utm_source=gb-gplus-sharePatent US5871886 - Sandwiched middle antireflection coating (SMARC) process
