A method of making a device includes forming a first hard mask layer over an underlying layer, forming first features over the first hard mask layer, forming a first spacer layer over the first features, etching the first spacer layer to form a first spacer pattern and to expose top of the first features,...http://www.google.de/patents/US8080443?utm_source=gb-gplus-sharePatent US8080443 - Method of making pillars using photoresist spacer mask
