A technique of patterning a conductive layer for interconnections in integrated circuits is disclosed. The technique enables fine line conductors to be fabricated. In accordance with the invention, a pattern for the conductors is etched into the surface of a substrate through the use of a patterned photoresist...http://www.google.de/patents/US4575402?utm_source=gb-gplus-sharePatent US4575402 - Method for fabricating conductors in integrated circuits
