The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm....http://www.google.de/patents/US7229273?utm_source=gb-gplus-sharePatent US7229273 - Imprint lithography template having a feature size under 250 nm
