The present invention is directed to a method of reducing distortions in a pattern disposed on a layer of a substrate, defining a recorded pattern, employing a mold having the pattern recorded therein, defining an original pattern. The method includes, defining a region on the layer in which to produce...http://www.google.de/patents/US20040089979?utm_source=gb-gplus-sharePatent US20040089979 - Method of reducing pattern distortions during imprint lithography processes
