A method of making a device includes forming a device layer, forming an organic hard mask layer over the device layer, forming a first oxide hard mask layer over the organic hard mask layer, forming a DARC layer over the first oxide hard mask layer, forming a photoresist layer over the DARC layer, patterning...http://www.google.de/patents/US8084366?utm_source=gb-gplus-sharePatent US8084366 - Modified DARC stack for resist patterning
