A method and a system are provided for calibrating metrological tools used to measure features of a semiconductor device. A critical dimension (CD) ruler defines a known pitch plus a pitch offset. A photoresist layer is measured to determine a measured pitch whereupon the measured pitch is compared to...http://www.google.de/patents/US7777884?utm_source=gb-gplus-sharePatent US7777884 - Method and system for optimizing sub-nanometer critical dimension using pitch offset
