A method for fabricating an electrostatic microswitch has the steps of depositing a silicon nitride layer over a silicon substrate with an opening therethrough to expose the planned sacrificial layer region; oxidation to form a silicon dioxide sacrificial layer; phosphorus ion implantation into the sacrificial...http://www.google.de/patents/US5489556?utm_source=gb-gplus-sharePatent US5489556 - Method for the fabrication of electrostatic microswitches
