It is an object of the present invention to provide a compact laser irradiation apparatus and a laser irradiation method that use a galvanometer mirror and an fθ lens, that suppress the interference caused by a secondary beam reflected on the rear surface of the substrate, that can perform homogeneous...http://www.google.de/patents/US20050139582?utm_source=gb-gplus-sharePatent US20050139582 - Laser irradiation apparatus, laser irradiation method, and method for manufacturing crystalline semiconductor film
