A method of creating a simulation model, includes acquiring a CD value of a photoresist pattern actually formed based upon a test pattern, acquiring information about a shape of the photoresist pattern, acquiring an intensity distribution of an optical image based upon the test pattern by performing...http://www.google.de/patents/US7840390?utm_source=gb-gplus-sharePatent US7840390 - Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium
