In the present invention, a semiconductor film is formed through a sputtering method, and then, the semiconductor film is crystallized. After the crystallization, a patterning step is carried out to form an active layer with a desired shape. The present invention is also characterized by forming a semiconductor...http://www.google.de/patents/US7126161?utm_source=gb-gplus-sharePatent US7126161 - Semiconductor device having El layer and sealing material
