The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes an upper plate, a lower plate and a gas manifold disposed there between. A substrate...http://www.google.de/patents/US6589361?utm_source=gb-gplus-sharePatent US6589361 - Configurable single substrate wet-dry integrated cluster cleaner
