A new method and apparatus for avoiding contamination of films deposited in layered depositions, such as Atomic Layer Deposition (ALD) and other sequential chemical vapor deposition (CVD) processes, is taught, wherein CVD-deposited contamination of ALD films is prevented by use of a pre-reaction chamber...http://www.google.de/patents/US20020162506?utm_source=gb-gplus-sharePatent US20020162506 - Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
