An illumination source or condenser used to project the image of a reticle onto a photosensitive substrate used in photolithography having a first reflective fly's eye, faceted mirror, or mirror array with predeterminedly positioned facets or elements and a second reflective fly's eye, faceted mirror,...http://www.google.de/patents/US6195201?utm_source=gb-gplus-sharePatent US6195201 - Reflective fly's eye condenser for EUV lithography
