In a plasma processing apparatus of this invention, a reaction chamber opposed to a plasma generating chmaber is entirely opened at its one side surface opposing the obect to be processed, and an interval between the one side surface and the other side surface is set to be an integer multiple of a 1/2...http://www.google.de/patents/US4970435?utm_source=gb-gplus-sharePatent US4970435 - Plasma processing apparatus
