A method for fabricating an electron device on a substrate includes the steps of forming a dummy film over the substrate such that the dummy film covers a device region of the substrate and an outer region of the substrate outside the device region, forming a dummy pattern by patterning the dummy film...http://www.google.de/patents/US7968466?utm_source=gb-gplus-sharePatent US7968466 - Fabrication process of a semiconductor device to form ultrafine patterns smaller than resolution limit of exposure apparatus
