Apparatus for plasma etching a layer of material upon a substrate comprising an anode having a first region protruding from a second region, wherein the second region defines a plane and the first region extends from said plane. In one embodiment, at least one solenoid is disposed near the apparatus...http://www.google.de/patents/US7316761?utm_source=gb-gplus-sharePatent US7316761 - Apparatus for uniformly etching a dielectric layer
