Methods are provided for treating germanium surfaces in preparation for subsequent deposition, particularly gate dielectric deposition by atomic layer deposition (ALD). Prior to depositing, the germanium surface is treated with plasma products or thermally reacted with vapor reactants. Examples of surface...http://www.google.de/patents/US7202166?utm_source=gb-gplus-sharePatent US7202166 - Surface preparation prior to deposition on germanium
