An exposure method forms, in a shot area on a reticle, marks to measure arrangement errors that may occur between adjacent device patterns, transfers the marks from the reticle onto a wafer through exposure and development processes using an exposure system, measures arrangement errors according to the...http://www.google.de/patents/US6558852?utm_source=gb-gplus-sharePatent US6558852 - Exposure method, reticle, and method of manufacturing semiconductor device
