An exposure apparatus includes a first reflective type photomask 18a, a first mask stage 100a for mounting the first reflected type photomask 18a, a second reflective type photomask 18b, and a second mask stage 180b for mounting the second reflective type photomask 18b. Light 11a from a light source...http://www.google.de/patents/US5418599?utm_source=gb-gplus-sharePatent US5418599 - Exposure method
