A process of fabricating an image sensor cell, on a semiconductor substrate, with the image sensor cell exhibiting low dark current generation, and high signal to noise ratio, has been developed. The process features the use of a photoresist shape, used to protect a previously formed photodiode element,...http://www.google.de/patents/US6306678?utm_source=gb-gplus-sharePatent US6306678 - Process for fabricating a high quality CMOS image sensor
