A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing...http://www.google.de/patents/US7068370?utm_source=gb-gplus-sharePatent US7068370 - Optical inspection equipment for semiconductor wafers with precleaning
