This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate....http://www.google.de/patents/US7351658?utm_source=gb-gplus-sharePatent US7351658 - Process for producing yttrium oxide thin films
