An electron-beam array lithography (EBAL) system and method of operation is described. The method comprises deriving fiducial marking signals from a lenslet stitching grid of fiducial elements formed on a standard stitching target for calibrating the boundaries of the fields of view of the respective...http://www.google.de/patents/US4467211?utm_source=gb-gplus-sharePatent US4467211 - Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system
