Device and method of fabricating device. The device includes a dual damascene line having a metal line and a via, and a redundant liner arranged to divide the metal line. The method includes forming a trench in a metal stripe of a dual damascene line, depositing a barrier layer in the trench, and filling...http://www.google.de/patents/US7279411?utm_source=gb-gplus-sharePatent US7279411 - Process for forming a redundant structure
