The present invention relates to a process and apparatus for the formation of conformal pure aluminum and doped aluminum coatings on a patterned substrate. It is directed to the use of low temperature thermal and plasma-promoted chemical vapor deposition techniques with biased substrate to provide conformal...http://www.google.de/patents/US6077571?utm_source=gb-gplus-sharePatent US6077571 - Conformal pure and doped aluminum coatings and a methodology and apparatus for their preparation
