A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected...http://www.google.de/patents/US20040053146?utm_source=gb-gplus-sharePatent US20040053146 - Method of varying template dimensions to achieve alignment during imprint lithography
