The present invention provides an anti-reflective Ta.sub.3 N.sub.5 coating which can be used in a dual damascene structure and for I line or G line lithographies. In addition, the Ta.sub.3 N.sub.5 coating may also be used as an etch stop and a barrier layer. A dual damascene structure is formed by...http://www.google.de/patents/US5741626?utm_source=gb-gplus-sharePatent US5741626 - Method for forming a dielectric tantalum nitride layer as an anti-reflective coating (ARC) 
