A magnetron especially advantageous for low-pressure plasma sputtering or sustained self-sputtering having reduced area but full target coverage. The magnetron includes an outer pole face surrounding an inner pole face with a gap therebetween. The outer pole of the magnetron of the invention is smaller...http://www.google.de/patents/US6790323?utm_source=gb-gplus-sharePatent US6790323 - Self ionized sputtering using a high density plasma source
