A chemical mechanical polishing system uses a shear force measurement system. Polishing parameters, such as the polishing pressure, can be adjusted in response to the measured shear force. For example, the pressure can be increased to avoid hydroplaning or decreased to avoid delamination or damage to...http://www.google.de/patents/US6869498?utm_source=gb-gplus-sharePatent US6869498 - Chemical mechanical polishing with shear force measurement
