Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that...http://www.google.de/patents/US6969753?utm_source=gb-gplus-sharePatent US6969753 - Spin-on-glass anti-reflective coatings for photolithography
