A method and apparatus of depositing a tungsten film by cyclical deposition in the formation of tungsten silicide for use in capacitor structures is provided. One embodiment of forming an electrode for a capacitor structure comprises depositing a polysilicon layer over a structure and depositing a tungsten...http://www.google.de/patents/US20030123216?utm_source=gb-gplus-sharePatent US20030123216 - Deposition of tungsten for the formation of conformal tungsten silicide
