A method of patterning an indium tin oxide (ITO) layer is performed on a glass substrate. First, using sputtering, an amorphous ITO layer is deposited on the glass substrate. Then, using excimer laser annealing (ELA), the amorphous ITO layer within a predetermined pattern is turned into a crystalline...http://www.google.de/patents/US6448158?utm_source=gb-gplus-sharePatent US6448158 - Method of patterning an ITO layer
