The structure and method which improves the film thickness uniformity or thickness control when using magnetron sputtering by adjusting the distance between the magnetron or a portion of the magnetron and the sputtering target to provide an improvement in the film thickness uniformity. Shimmed rails,...http://www.google.de/patents/US5855744?utm_source=gb-gplus-sharePatent US5855744 - Non-planar magnet tracking during magnetron sputtering
