Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces are disclosed herein. In one embodiment, an end effector for conditioning a polishing pad includes a member having a first surface and a plurality of contact elements projecting from the first surface. The...http://www.google.de/patents/US7997958?utm_source=gb-gplus-sharePatent US7997958 - Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces
