A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed...http://www.google.de/patents/US5280154?utm_source=gb-gplus-sharePatent US5280154 - Radio frequency induction plasma processing system utilizing a uniform field coil
