200 mm and 300 mm wafers are processed in vacuum plasma processing chambers that are the same or have the same geometry. Substantially planar excitation coils having different geometries for the wafers of different sizes excite ionizable gas in the chamber to a plasma by supplying electromagnetic; fields...http://www.google.de/patents/US6531029?utm_source=gb-gplus-sharePatent US6531029 - Vacuum plasma processor apparatus and method
