An enhanced method and apparatus for forming openings in a photosensitive layer. Using a standard microlithographic printer such as stepper or scan and step system, an unpatterned photosensitive layer is exposed to a first mask having an opening pattern with dimensions within tight (for a given technology...http://www.google.de/patents/US5532090?utm_source=gb-gplus-sharePatent US5532090 - Method and apparatus for enhanced contact and via lithography
