A support structure is applied directly to the first side of a semiconductor work piece or wafer by a stereolithographic process layer by layer completely about and extending inwardly of the periphery of the wafer, but external to the selected area within which a desired circuitry pattern is placed,...http://www.google.de/patents/US20040229002?utm_source=gb-gplus-sharePatent US20040229002 - Stereolithographic seal and support structure for semiconductor wafer
