The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and...http://www.google.de/patents/US8064038?utm_source=gb-gplus-sharePatent US8064038 - Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
