There is disclosed a structure of and a method for fabricating a ferroelectric film on a non-conductive substrate. An adhesion layer, e.g., a layer of silicon dioxide and a layer of zirconium oxide, is deposited over a substrate. A conductive layer, e.g., a noble metal, a non-noble metal, or a...http://www.google.de/patents/US5719417?utm_source=gb-gplus-sharePatent US5719417 - Ferroelectric integrated circuit structure
