A method of processing a substrate includes the steps of developing a substrate having a photo-sensitive resin film formed on its surface; washing the substrate by supplying washing liquid to the surface of the substrate, and rotating the substrate on a perpendicular axis in a horizontal...http://www.google.de/patents/US5678116?utm_source=gb-gplus-sharePatent US5678116 - Method and apparatus for drying a substrate having a resist film with a miniaturized pattern 
