An atomic deposition (ALD) thin film deposition apparatus includes a deposition chamber configured to deposit a thin film on a wafer mounted within a space defined therein. The deposition chamber comprises a gas inlet that is in communication with the space. A gas system is configured to deliver gas...http://www.google.de/patents/US20060266289?utm_source=gb-gplus-sharePatent US20060266289 - Reaction system for growing a thin film
