A method of manufacturing a microminiature solid-state device includes first and second exposure steps in which radiation-sensitive material on a solid-state substrate is exposed radiation through a mask pattern to define locations for localized processing. A local processing step between the first and...http://www.google.de/patents/US4256829?utm_source=gb-gplus-sharePatent US4256829 - Method of manufacturing solid-state devices in which planar dimensional distortion is reduced
