An exposure apparatus for transferring a pattern onto an object via a projection optical system, including a moving body arranged on an image plane side with respect to the projection optical system, a wave-front measuring unit at least a part of which is arranged in the moving body, and which measures...http://www.google.de/patents/US7215408?utm_source=gb-gplus-sharePatent US7215408 - Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
