A vapor-phase film growth apparatus includes a substrate holder for holding a substrate, a gas ejection head, and a radiant heat shield device. The substrate holder has a substrate heater therein, and the gas ejection head has a gas injection surface for ejecting a material gas toward a substrate held...http://www.google.de/patents/US6132512?utm_source=gb-gplus-sharePatent US6132512 - Vapor-phase film growth apparatus and gas ejection head
