A method for insitu performing a cleaning operation along with a physical sputtering operation begins by placing a wafer (26) into a chamber (12). A plasma (30) is generated within the chamber (12) using an inert, noble, or reducing gas. The gas is ionized to form ions (32) within the plasma (30). Power...http://www.google.de/patents/US6187682?utm_source=gb-gplus-sharePatent US6187682 - Inert plasma gas surface cleaning process performed insitu with physical vapor deposition (PVD) of a layer of material
