An improved magnetron sputter source particularly suitable for magnetic materials is provided in the forming of an unfolded Penning discharge source. The two cathodes are in the form of an inner cathode roughly coplanar with an outer cathode ring. An anode radially between the cathodes is raised above...http://www.google.de/patents/US4629548?utm_source=gb-gplus-sharePatent US4629548 - Planar penning magnetron sputtering device
