An improved apparatus for the automatic handling of wafer materials is proposed for the plasma treatment of the wafers such as high-purity silicon semiconductor wafers. In this apparatus, the wafer carried by a carrier means to a position neighboring to a wafer table is picked up by a movable pick-up...http://www.google.de/patents/US4208159?utm_source=gb-gplus-sharePatent US4208159 - Apparatus for the treatment of a wafer by plasma reaction
